Download Crystal growth and evaluation of silicon for VLSI and ULSI by Golla Eranna PDF

By Golla Eranna
Silicon, as a single-crystal semiconductor, has sparked a revolution within the box of electronics and touched approximately each box of technological know-how and know-how. notwithstanding to be had abundantly as silica and in a variety of other kinds in nature, silicon is tough to split from its chemicals as a result of its reactivity. As a great, silicon is chemically inert and strong, yet transforming into it as a unmarried crystal creates many technological challenges.
Crystal development and overview of Silicon for VLSI and ULSI
is one of many first books to hide the systematic progress of silicon unmarried crystals and the total overview of silicon, from sand to priceless wafers for equipment fabrication. Written for engineers and researchers operating in semiconductor fabrication industries, this useful text:
- Describes varied options used to develop silicon unmarried crystals
- Explains how grown single-crystal ingots turn into an entire silicon wafer for integrated-circuit fabrication
- Reviews various easy methods to assessment silicon wafers to figure out suitability for machine applications
- Analyzes silicon wafers when it comes to resistivity and impurity focus mapping
- Examines the influence of intentional and unintended impurities
- Explores the defects present in ordinary silicon-crystal lattice
- Discusses silicon wafer coaching for VLSI and ULSI processing
Crystal progress and assessment of Silicon for VLSI and ULSI is an important reference for various methods to the choice of the fundamental silicon-containing compound, separation of silicon as metallurgical-grade natural silicon, next purification, single-crystal progress, and defects and assessment of the deviations in the grown crystals.
Read or Download Crystal growth and evaluation of silicon for VLSI and ULSI PDF
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Crystal growth and evaluation of silicon for VLSI and ULSI
Silicon, as a single-crystal semiconductor, has sparked a revolution within the box of electronics and touched approximately each box of technology and know-how. although to be had abundantly as silica and in numerous different kinds in nature, silicon is hard to split from its chemicals as a result of its reactivity.
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Additional info for Crystal growth and evaluation of silicon for VLSI and ULSI
Example text
Because of this, other silicon properties, such as oxidation, proceed at a higher pace when compared to other crystal planes. When n-type and p-type materials are brought together, the region where the silicon changes is called a p-n junction. By arranging junctions in certain physical structures, such as n-p-n, p-n-p, n-MOS, p-MOS, or p-n-p-n, and combining these with other physical structures, various semiconductor devices are constructed. Over the years, silicon semiconductor processing has evolved sophisticated techniques for building these junctions and other structures with special properties.
In this process, purification was achieved by treating the melt with chlorine, a chlorine-oxygen mixture, hydrogen chloride, and hydrogen fluoride gases. In this method, halogens and hydrogen halides react with the metallic impurities, convert to volatile halides, and are carried from the reaction chamber by the argon purging gas. 2 Schematic diagram of the apparatus for the purification of metallurgical silicon. (From T. L. Chu, G. A. van der Leeden, and H. I. ) energies of formation and are volatile at the melting point of silicon, this treatment results in removing all possible metals as halides from the molten silicon.
New York, 1964. 2. W. G. Pfann, “The semiconductor revolution,” Journal of the Electrochemical Society, 121, 9C–15C, 1974. 3. G. Fisher, M. R. Seacrist, and R. W. Standley, “Silicon crystal growth and wafer technologies,” Proceedings of the IEEE, 100, 1454–1474, 2012. 4. J. Vanhellemont and E. Simoen, “Brother silicon, sister germanium,” Journal of the Electrochemical Society, 154, H572–H583, 2007. P. J. French, “Polysilicon: A versatile material for microsystems,” Sensors and Actuators, A99, 3–12, 2002.